ROLE OF SILICON APPLICATION IN THE AUGMENTATION THE PLANT RESISTANCE UNDER FLUORIDE STRESS: A REVIEW
. KANCHAN
Department of Bioscience and Biotechnology, Banasthali Vidyapith, Rajasthan, India.
CHELLAPILLA BHARADWAJ
Genetics Division, Indian Agricultural Research Institute, Pusa, New Delhi, India.
IWUALA EMMANUEL
Department of Plant Science, Federal University, Oye Ekiti, Nigeria.
AFROZ ALAM
*
Department of Bioscience and Biotechnology, Banasthali Vidyapith, Rajasthan, India.
*Author to whom correspondence should be addressed.
Abstract
Salinity stress, mainly elevated levels of fluoride affects the growth and development of crop plants which causes huge decline in crop yield. Salinity stress decreases the chlorophyll pigments concentration hence reduces photosynthetic rate resulting into poor plant growth. Fluoride induced accumulation of ROS leads to oxidative stress which adversely affects plant metabolism. In plants, the attainment of salt tolerance via breeding method is difficult due to complexity and polygenic nature of salt tolerance traits. Hence, silicon application is one of the preferred approaches that have potential mitigate the adverse effect of salinity stress, especially fluoride in eco-friendly way. In this review an attempt is made to enhance the understanding in all-inclusive way.
Keywords: Fluoride toxicity, plant stresses, resistance, silicon