1.
KANCHAN ., BHARADWAJ C, EMMANUEL I, ALAM A. ROLE OF SILICON APPLICATION IN THE AUGMENTATION THE PLANT RESISTANCE UNDER FLUORIDE STRESS: A REVIEW. BN [Internet]. 27Mar.2021 [cited 13Jun.2021];41(1):6-8. Available from: https://www.globalpresshub.com/index.php/BN/article/view/989